Irradiation/Implantation

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Our equipment allows for irradiation and implantation of materials with a wide range of ions with energies from 600 keV up to about 70 MeV (depending on atomic species). The size of the implanted area is restricted to approximately 1.5 cm2. Samples can be heated or cooled during implantation.

This service is also offered to organizations and persons other than public research institutions. Cost of service depends mainly on the machine time and manpower required. Turn-around times can be from days to several weeks.


For more details please contact .

Sapphire sample scintillating under ion beam irradiation  
Sapphire sample scintillating under ion beam irradiation
 
 
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Sat May 27 13:35:47 CEST 2017
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